Research Article
High Reliabilities Design of Stacked Ultra-High-Voltage nLDMOSs in a 0.5-μm BCD Semiconductor Technology
Shen-Li Chen*, Po-Lin Lin, Hung-Wei Chen and Yi-Mu Lee
Department of Electronic Engineering, National United University, Taiwan
Shen-Li Chen, Department of Electronic Engineering, National United University, Miao Li City 36063, Taiwan.
Received Date: November 08, 2021; Published Date: November 24, 2021
Abstract
High holding voltage of the stacked circular ultra-high voltage (UHV) nLDMOS component with slightly lowered ESD ability is developed by a TSMC 0.5-μm Bipolar-CMOS-DMOS (BCD) process. The holding voltage is an important parameter concerned with the latch-up immunity in a CMOS IC. In general, the holding-voltage value of a traditional nLDMOS is much lower than the supply voltage (VDD), there has high latch-up risk. In this paper, a stacking architecture of nLDMOS transistors is used to investigate the ESD ability and latch-up immunity. From experimental results, as three nLDMOS DUTs were stacked, this component has a highest holding voltage up to 180.59-V and a relatively vigorous ESD capability under without altering the operating voltage of the DUT.
Keywords: Electrostatic discharge (ESD); Holding voltage (Vh); Latch-up (LU); Lateral-diffused MOSFET (LDMOS); Transmission-line pulse (TLP); Ultra-high voltage (UHV)
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Shen-Li Chen, Po-Lin Lin, Hung-Wei Chen, Yi-Mu Lee. High Reliabilities Design of Stacked Ultra-High-Voltage nLDMOSs in a 0.5-μm BCD Semiconductor Technology. Mod Concept Material Sci. 4(4): 2021. MCMS. MS.ID.000593. DOI: 10.33552/MCMS.2021.04.000593.
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Electrostatic discharge (ESD), Holding voltage (Vh), Latch-up (LU), Lateral-diffused MOSFET (LDMOS), Transmission-line pulse (TLP), Ultra-high voltage (UHV), Reliability, Breakdown voltage, nLDMOS, Semiconductor, Current
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